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Lab Technical Specifications
- Scanning Electron Microscope (SEM) with LaB6 electron gun, integrated with full e-beam lithography (EBL) system
- SEM: 30 kV accelerating voltage, 3 nm resolution, 300,000 magnification, 1 pA 1 ΅A beam current, 5 axis X-Y-Z-R-T stage, Low vacuum mode for non-conductive sample observation.
- EBL: PC-Pattern Generator with basic shapes, 20 nm resolution, 10 MHz writing speed, 2 axis X-Y laser stage, 25 nsec cutoff time, 100 Χ 100 mm maximum scan, 10nm stitching.